| abstract |
The invention relates to a structure comprising at least one layer (1) comprising a MXDT / XT copolyamide in which: MXDT is an amide unit having a molar ratio ranging from 5 to 45%, preferably from 15 to 45%. %, more preferably 20 to 45%, where MXD is m-xylylene diamine (MXD) and T is terephthalic acid, XT is a major amide unit unit present at a mole ratio of 55 to 95%, preferably from 55 to 85%, more preferably from 55 to 80%, where X is a C9 to C18, preferably C9, C10, C11 and C12 linear aliphatic diamine and where T is terephthalic acid, said copolyamide having a temperature melting point: 250 ° C <Tf ≤ 300 ° C as determined according to ISO 13357-3 (2013). |