http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2997187-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01C10-10 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01L1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01P15-0802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01P15-123 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01L9-00 |
| filingDate | 2012-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_890b8fbebc7de65a6c10ebfa250110d2 |
| publicationDate | 2014-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | FR-2997187-A1 |
| titleOfInvention | PROCESS FOR PRODUCING A PIEZORESISTIVE SENSOR |
| abstract | The invention relates to a method for manufacturing a piezoresistive sensor comprising at least one polyimide lever provided with at least one electrode, characterized in that it comprises, from a sheet of polyimide covered with a metal layer the following steps: (a) depositing a layer made of a positive photosensitive material on the metal layer; (b) depositing a mask on the layer of photosensitive material, said mask being a positive mask whose pattern defines at least the shape of or each metal electrode to be made of the sensor; (c) insolating the assembly formed at the end of step (b) on the side of the layer of photosensitive material to activate the portion of this layer which is not protected by the mask; (d) remove the mask; (e) chemically revealing the pattern of the layer of photosensitive material defined by the mask, this step making it possible to remove the portion of the photosensitive layer that is exposed during step (c) and thus to expose part of the metal layer; (f) annealing to cure the portion of the remaining photosensitive material layer; (g) chemically removing the portion of the metal layer which has been exposed in step (e), for example in a basic or acidic aqueous solution; (h) removing the portion of the remaining photosensitive material layer so as to form a polyimide sheet on which is deposited the metal pattern corresponding to that of the mask; (i) forming the or each lever in the polyimide sheet. |
| priorityDate | 2012-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.