| abstract |
The subject of the invention is a glazing unit comprising a glass substrate (1) provided on one of its faces, intended to form the face 1 of said glazing in the position of use, with a stack of thin layers comprising, since said substrate (1), a layer (2) of an electrically conductive transparent oxide based on tin oxide and indium of a physical thickness el in a range from 50 to 200 nm, a barrier layer of silicon nitride (3) of physical thickness e, then a layer based on silicon oxide (4), said thicknesses e and e, expressed in nanometers being such that 0.11 <= e / e <= 0, 18. |