| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-8828
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-231
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N70-066 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-00 |
| filingDate |
2012-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c54ef637626c06eeefc16ea474ad25a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49cf0886ebcd459bdcf9c6c3a34d49d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9911eef1b7c41e44a37a9c8ec97fde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4006e4f69daecf0f4e05e1cade7586f9 |
| publicationDate |
2012-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
FR-2974530-A1 |
| titleOfInvention |
CHEMICAL MECHANICAL POLISHING COMPOSITION AND PROCESS FOR POLISHING GERMANIUM-ANTIMONY-TELLURE ALLOYS |
| abstract |
A method of chemical mechanical polishing of a substrate comprising a germanium-antimony-phase chalcogenide phase change (GST) alloy is described, using a chemical mechanical polishing composition consisting essentially of, as initial components: water; an abrasive; a material selected from ethylenediaminetetraacetic acid and its salts; and an oxidizing agent; wherein the chemical mechanical polishing composition facilitates a high rate of GST removal with few defects. |
| priorityDate |
2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |