http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2965749-A1

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filingDate 2010-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber FR-2965749-A1
titleOfInvention MULTILAYER STRUCTURE COMPRISING PRECIOUS METAL ATTACHED TO DIELECTRIC SUBSTRATE PROCESS AND USE THEREOF
abstract The invention relates to a multilayer structure comprising: a dielectric substrate (1); a tie layer (4) which extends on a first face of the dielectric substrate (1) -at least one layer of precious metal ( 3.31) placed on the tie layer (4), said tie layer (4) comprising a derivative of an alkylsilane compound characterized in that the precious metal layer is put in place by evaporation or by spraying said precious metal. The invention also relates to a method of manufacturing such a device based on either electron beam lithography, optical insolation or nanoimpression.
priorityDate 2010-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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