| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2203-0127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2203-0315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2207-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24273 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00476
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53295 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C99-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52 |
| filingDate |
2008-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_393209989cfab7baa7bcdb4b8b9404a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3e6463283a618c8f3b0f4a429351d2d |
| publicationDate |
2009-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
FR-2926294-A1 |
| titleOfInvention |
METHOD FOR PRODUCING AIR CAVITIES IN MICROSTRUCTURES |
| abstract |
The invention relates to a method for producing at least one air cavity in a microstructure, of the type comprising the degradation of a sacrificial material by diffusion of a chemical etching agent through a membrane. comprises: a) providing a microstructure comprising at least one cavity filled with a sacrificial material, said cavity being limited on at least part of its surface by an impermeable membrane but which can be made permeable under the action of a chemical etchant, which agent is also capable of degrading the sacrificial material, b) contacting the microstructure with said etching agent to render the membrane permeable and degrade the sacrificial material; etc) the elimination of the chemical attack agent from the microstructure.Applications: microelectronics, micro-technology. |
| priorityDate |
2008-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |