| abstract |
The invention relates to a component manufacturing method comprising a monocrystalline silicon substrate (10, 16) on which is deposited an insulating layer (12) on which is superimposed a layer of silicon (14), the method comprising the steps following: during a first step (32a), a metal (24) is sprayed onto a monocrystalline silicon plate (10, 16) in an oxygen plasma, so as to create a layer of this metal on the plate (10, 16) to form the insulating layer, then- during a second step (32b) plasma is sprayed with silicon (24) and / or germanium on this oxide layer. |