| abstract |
A method for treating at least one surface portion of at least one layer A located between a substrate and a layer B of a stack of thin layers deposited under vacuum on the substrate with a glass function, according to the invention, characterized in that: - the deposition of at least one thin layer A at a surface portion of said substrate, this deposition phase being carried out by a vacuum deposition process, is generated using of at least one linear ion source, a plasma of species ionized from a gas or a gaseous mixture, at least one surface portion of the layer A is subjected to said plasma so that said ionized species modifies at least one less partially the surface state of the layer A, - the deposition of at least one layer B at a surface portion of the layer A, this deposition phase being carried out by a vacuum deposition method . |