| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b1007735376d07808ebe297f823b2829 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-951
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2201-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136231 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-12 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1362 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2004-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9fff6183e59cea4ecc52bb00887295e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57694dc08d742d15b71d65697a7b5c4c |
| publicationDate |
2005-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
FR-2860918-A1 |
| titleOfInvention |
METHOD FOR MANUFACTURING THIN FILM TRANSISTOR MATRIX SUBSTRATE |
| abstract |
A method of manufacturing a thin film transistor capable of simplifying a substrate structure and a manufacturing method are described. The method of manufacturing a thin-film transistor array substrate comprises a three-step masking process, which comprises: forming a gate pattern on a substrate; forming a gate insulating film on the substrate having the gate pattern thereon; forming a source / drain pattern and a semiconductor pattern; forming a passivation film to protect the thin film transistor over the entire surface of the substrate; forming a pattern of photosensitive resin on the passivation film; molding the passivation film using the photosensitive resin pattern to form a passivation film pattern; and forming a transparent electrode pattern extending from a side surface of the passivation film pattern and formed in an area excluding the passivation film pattern. |
| priorityDate |
2003-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |