http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2805393-A1

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filingDate 2000-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93a7aa98bc3a0143ade8070f83ddb576
publicationDate 2001-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber FR-2805393-A1
titleOfInvention METHOD FOR PRODUCING A DIELECTRIC LAYER ON A GLASS SUBSTRATE COATED WITH CONDUCTIVE ELECTRODES
abstract The present invention relates to a method for producing a dielectric layer on a glass substrate (1) covered with conductive electrodes (2). According to the process, a first layer (3) of an enamel having a boron oxide concentration of less than or equal to 16% by mass is deposited, then a second layer (4) of an enamel having a higher boron oxide concentration. or equal to 20% by mass and the whole is baked at a temperature between 550degreC and 600degreC. The invention applies more particularly to plasma panels.
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