Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_25694ab40fd7f854b8abe91c7e80d089 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2211-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J65-046 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3411 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 |
filingDate |
2000-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93a7aa98bc3a0143ade8070f83ddb576 |
publicationDate |
2001-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
FR-2805393-A1 |
titleOfInvention |
METHOD FOR PRODUCING A DIELECTRIC LAYER ON A GLASS SUBSTRATE COATED WITH CONDUCTIVE ELECTRODES |
abstract |
The present invention relates to a method for producing a dielectric layer on a glass substrate (1) covered with conductive electrodes (2). According to the process, a first layer (3) of an enamel having a boron oxide concentration of less than or equal to 16% by mass is deposited, then a second layer (4) of an enamel having a higher boron oxide concentration. or equal to 20% by mass and the whole is baked at a temperature between 550degreC and 600degreC. The invention applies more particularly to plasma panels. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1345248-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1345248-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1887601-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1858053-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1887601-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1858053-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8072142-B2 |
priorityDate |
2000-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |