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publicationDate 2000-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber FR-2794538-A1
titleOfInvention COVERING COMPOSITION FOR PHOTORESIST AND METHOD FOR FORMING A FINE PATTERN USING THE SAME
abstract The invention relates to a top coating composition protecting against contamination by amines for a photoresist. According to the invention, it comprises a top coating composition and a basic compound. The invention applies in particular to the manufacture of semiconductor devices.
priorityDate 1999-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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