| abstract |
The invention relates to a method for purifying a cryogenic fluid, in particular argon, nitrogen, helium or oxygen, comprising impurities N2 O, Cn Hm or NOx, in which the impurities are removed by placing in contact with the cryogenic fluid to be purified with adsorbent particles having an average size less than or equal to 1.5 mm, preferably from 0.8 mm to 1.1 mm. A purified cryogenic fluid containing less than 100 ppb of impurities, preferably less than 10 ppb of impurities, is then recovered. This process can be used to produce ultra-pure gases intended in particular for the field of electronics. |