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filingDate 1997-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae9912b6062ec5252c3536ed6516a630
publicationDate 1998-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber FR-2765398-A1
titleOfInvention STRUCTURE WITH MICROELECTRONIC COMPONENT IN SEMICONDUCTOR MATERIAL DIFFICULT OF ENGRAVING AND WITH METALLIC HOLES
abstract The invention relates to a structure comprising a microelectronic component (20) made of a semiconductor material which is difficult to etch. This structure is obtained by joining a thin film (12) of the semiconductor material which is difficult to etch on the front face of a first substrate made of material which is easy to etch and which serves as a support. The microelectronic component (20) is produced in the thin film (12) and a through hole (33) is etched in the structure and metallized (35) so as to electrically connect an electrode (18) formed on the rear face of the first substrate to an electrode (24) of the microelectronic component (20).
priorityDate 1997-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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