| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
1989-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a83a26081091ceb21586a78c6722f2b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64b00d89195bcbd9a3b177905679ffb0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0e7804421f8df150b61b28ba98d8344 |
| publicationDate |
1990-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
FR-2648468-A1 |
| titleOfInvention |
RESIST COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRONS |
| abstract |
Resin composition sensitive to UV radiation and electrons. The composition of the invention comprises a polymeric base and a photosensitizer dissolved in an organic solvent, the polymeric base containing at least one polymer or a copolymer comprising a base unit of formula I: (CF DRAWING IN BOPI) where A represents H or a chemical bond; where R1 represents: (CF DRAWING IN BOPI) with R representing H or an alkyl radical; where R2 represents H or OH; where R3 represents H or an alkyl radical and Z represents a halogen, a hologenomethyl radical, or -O-Y with Y representing: (CF DRAWING IN BOPI) |
| priorityDate |
1989-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |