http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2645158-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e9fd47dbce032c7b85d35fb324cd69f7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F38-00 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F38-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-48 |
filingDate | 1989-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67898df03b7cc2d6918259e521acc33a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_625d43c2482af4ae12e145374e91c1aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28e7144641f041d5bd2498411d2fb609 |
publicationDate | 1990-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | FR-2645158-A1 |
titleOfInvention | THERMOSETTING POLYMIDABLE SCHIFF BASED RESINS, THEIR PREPARATION AND THEIR APPLICATIONS |
abstract | Thermosetting Schiff base resins, their preparation and applications are described. These thermosetting Schiff base resins can be defined as corresponding to the general formula: (CF DRAWING IN BOPI) The Ar1, Ar2 and Ar3 radicals are chosen so that the softening temperature of the resins is less than about 150 degree (s) C . The resins can be prepared by direct condensation of an ethynyl benzaldehyde or acetophenone with a telechelic diamine oligomer obtained by reacting a diamine containing flexibilizing groups with a derivative of benzhydrol tetracarboxylic acid. These Schiff base resins can be used by thermal mass polymerization to prepare in particular adhesives or composite matrices. |
priorityDate | 1989-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.