http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2516549-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f386fc663bad9cc454f8e939db42d01e |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1608 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1651 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16 |
filingDate | 1981-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37a0a57034353368ad63f884ebafc4ca http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cffcdee09fe29a7f0f56303ae119950 |
publicationDate | 1983-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | FR-2516549-A1 |
titleOfInvention | SILICON SEMICONDUCTOR NICKELING METHOD AND METHOD FOR MANUFACTURING SOLAR CELLS COMPRISING THESE NICKEL SEMICONDUCTORS |
abstract | THE PROCESS DESCRIBED IN THE PRESENT INVENTION INCLUDES IMMERSION OF A SILICON SUBSTRATE IN A SUITABLE NICKEL BATH SO THAT THE NICKEL IONS IN THE BATH ARE TRANSFORMED TO SOLID NICKEL AND DEPOSITED ON THE SUBSTRATE TO FORM A LAYER ADHERENT THEREOF. . THIS PROCESS DOES NOT REQUIRE CATALYTIC PRE-TREATMENT OF THE SILICON SURFACE BEFORE RECEIVING THE NICKEL LAYER. USE OF THIS PROCESS FOR THE NICKELING OF DEVICES WITH THIN SILICON JUNCTIONS WITH A VIEW TO OBTAINING OHMIC CONTACTS. |
priorityDate | 1981-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.