| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0783
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-162 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F299-065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K35-224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-672 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K35-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
| filingDate |
1981-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e940def392c090ff57ea4159ab90b2e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7f77449810c16d872328281513d1359
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65e3ab5c20c234fbaa1d3b322a271f29 |
| publicationDate |
1982-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
FR-2491639-A1 |
| titleOfInvention |
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT OBTAINED USING THE RESIN |
| abstract |
COMPOSITION OF PHOTOSENSITIVE RESIN AND PHOTOSENSITIVE ELEMENT OBTAINED WITH THE HELP OF THIS RESIN. COMPOSITION OF PHOTOSENSITIVE RESIN COMPRISING A. 20 TO 75 PARTS BY WEIGHT OF URETHANE DIACRYLATE OR DIMETHACRYLATE OBTAINED BY REACTING I. TRIMETHYLHEXAMETHYLENE DIISOCYANATE AND II. AN ACRYLIC OR METHACRYLIC MONOESTER OF A DIALCOOL; B. 20 TO 75 PARTS BY WEIGHT OF A LINEAR POLYMER HAVING A GLASS TRANSITION TEMPERATURE OF ABOUT 40-150C, AND C. A SENSITIZER AND OR A SENSITIZER SYSTEM WHICH GIVES FREE RADICALS UNDER THE INFLUENCE OF THE ACTINIC LIGHT. THIS COMPOSITION OF PHOTOSENSITIVE RESIN IS SUITABLE FOR THE PREPARATION OF WELDING MASKS USED FOR PRINTED CIRCUIT BOARDS. |
| priorityDate |
1980-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |