http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2389926-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_634538388f2dd27ea0a8bc2a2032c517 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1978-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1978-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | FR-2389926-A1 |
| abstract | Method for sensitizing photosensitive masking products and new products thus obtained. In this process, the photosensitive masking layer is contacted with a sensitizing solution, comprising about 50 to 100% by weight of at least one normally liquid aliphatic halogenated hydrocarbon, as solvent, selected from methylene chloride, trichloromonofluoromethane, tetrachlorodifluoroethane, trichlorotrifluoroethane, dichlorotetrafluoroethane, and mixtures thereof, and about 0 to about 50% by weight of a non-halogenated, normally liquid organic material miscible with the halogenated hydrocarbon solvent, at a temperature and for a period of time sufficient to remove the remaining parts of the photosensitive masking product, without removing the selected parts of this product. The present invention is particularly useful for sensitizing photosensitive masking products using solutions avoiding the disadvantages of xylene, due to the evacuation and flammability problems posed by xylene. |
| priorityDate | 1977-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.