| abstract |
A method for producing a glass substrate provided with a coating film, comprising a step of forming a layer containing TiO2 on a glass substrate by the low temperature plasma CVD method using a film-forming material containing at least one member selected from the group consisting of an alkoxide-type titanium material, an amide-type titanium material, and a halide-type titanium material, by applying electrical power to a plasma source by means of a power source to produce a plasma power density of at least 55 kW / m at a film-forming rate of 15 to 200 nm-m / min, where the plasma source is a linear plasma source, where the unit [kW / m] of the plasma power density represents an electrical energy [kW] applied by 1 m of the plasma source, and where the unit [nm-m / min] of the film formation rate represents the thickness of the film [nm] of the TiO2-containing layer obtained when a glass substrate moves at a speed of 1 m / min in a direction at right angles to the longitudinal direction of the linear plasma source. |