http://rdf.ncbi.nlm.nih.gov/pubchem/patent/ES-2711108-T3
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec5b8c0fc1f827c1360a8f5ea5652225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ec8cc9252674f81e0b8bc0c122381bd |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24174 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T50-60 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C28-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-228 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C4-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 |
filingDate | 2013-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2019-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3ea13048697985f7a863944edbe2c2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b65fafcde4d237b9eb7183495da8b135 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2eb6ee799b88592a37b54009c27792ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c46430b9a3fc7a374f380706a72ad717 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f765b92a5bf08d0b8b13008ca4dadece http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06d1f157604c941276b7461ae9a7337c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27a45863ed1ea48b231e64bbac151e71 |
publicationDate | 2019-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | ES-2711108-T3 |
titleOfInvention | Procedure to apply a thermal insulation layer |
abstract | Procedure for the application of a thermal insulation layer (10) on a substrate surface, in which in the procedure a working chamber (2) with a plasma torch (4) is provided, a plasma jet ( 5) and it is directed on the surface of a substrate (3) introduced in the working chamber, a ceramic coating material is applied by means of Physical Vapor Deposition of Plasma Spraying or in a brief way-PS-PVD procedure on the surface of the substrate, the coating material being injected as powder into the plasma jet and being partially or totally evaporated there, characterized in that during the application of the thermal insulation layer (10) in a first working stage the rate of feeding of the injected powder in such a way that a large part of the injected powder evaporates, in the first working stage the coating material is condensed from the vapor phase on the surface of the s substrate and mixed phases are formed with the material on the surface of the substrate, in a second work stage the feed rate of the injected powder is increased by at least a factor of 3, thereby reducing the relative portion of the injected powder, which evaporates, and in the second working step the coating material is separated in the form of elongated columns, which form an anisotropic microstructure, and which are aligned essentially perpendicular to the surface of the substrate. |
priorityDate | 2012-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.