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publicationDate 2019-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber ES-2711108-T3
titleOfInvention Procedure to apply a thermal insulation layer
abstract Procedure for the application of a thermal insulation layer (10) on a substrate surface, in which in the procedure a working chamber (2) with a plasma torch (4) is provided, a plasma jet ( 5) and it is directed on the surface of a substrate (3) introduced in the working chamber, a ceramic coating material is applied by means of Physical Vapor Deposition of Plasma Spraying or in a brief way-PS-PVD procedure on the surface of the substrate, the coating material being injected as powder into the plasma jet and being partially or totally evaporated there, characterized in that during the application of the thermal insulation layer (10) in a first working stage the rate of feeding of the injected powder in such a way that a large part of the injected powder evaporates, in the first working stage the coating material is condensed from the vapor phase on the surface of the s substrate and mixed phases are formed with the material on the surface of the substrate, in a second work stage the feed rate of the injected powder is increased by at least a factor of 3, thereby reducing the relative portion of the injected powder, which evaporates, and in the second working step the coating material is separated in the form of elongated columns, which form an anisotropic microstructure, and which are aligned essentially perpendicular to the surface of the substrate.
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