| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c5561203784cbc604a4f34191a88204 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-32 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1641
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-2086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25B1-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-14 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25B1-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-02 |
| filingDate |
2014-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b479783fde5ac17b368d26e9ee56295
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cabda29c29da51798ef64ac593d4a9c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cdf3a93768184464758461e53714709 |
| publicationDate |
2018-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
ES-2685409-T3 |
| titleOfInvention |
Composition for the chemical etching treatment of a resin material |
| abstract |
Composition for the treatment by chemical etching of a resin material, the composition comprising an aqueous solution having a concentration of permanganate ion of 0.2 mmol / more and a total acid concentration of 10 moles / most with an upper limit 15 mol / l and the aqueous solution satisfying the following condition (3): (3) set the amount of addition of an anhydrous magnesium salt at 0.1 to 1 mol / l and in which the aqueous solution optionally also satisfies minus one of the following conditions (1) and (2): (1) contain an organic sulphonic acid in an amount of 1.5 moles / more, and (2) set the molar concentration of divalent manganese ion to 15 or more times higher than the molar concentration of permanganate ion. |
| priorityDate |
2013-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |