Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-378 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-372 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-39 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G69-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L77-06 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L77-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-378 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-372 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G69-26 |
filingDate |
2010-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fd656b890b4ec2b18697fe123830b96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f884d3265d908f0e58553585e8e6cb8b |
publicationDate |
2017-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
ES-2621970-T3 |
titleOfInvention |
Polyamide resin composition and molded article |
abstract |
Composition of polyamide resin comprising: (A) a polyamide composed of a diamine unit containing 70 mol% or more of a paraxilylenediamine unit and a dicarboxylic acid unit containing 70 mol% or more of a linear aliphatic dicarboxylic acid unit having 6 to 18 carbon atoms; (B) an aromatic secondary amine compound; and (C) an organic sulfur-based compound, the polyamide resin composition containing 0.05 to 5 parts by mass of the aromatic secondary amine compound (B) and 0.05 to 5 parts by mass of compound a organic sulfur base (C) based on 100 parts by mass of polyamide (A), in which the organic sulfur-based compound (C) is at least one selected from mercaptobenzimidazole-based compounds, acid-based compounds dithiocarbamic, thiourea-based compounds and organic thioacid-based compounds. |
priorityDate |
2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |