| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a347c2939ec43a4060054df1526348f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-365 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216 |
| filingDate |
2008-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ddafac741a2cd69e48340fdabf7a611 |
| publicationDate |
2012-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
ES-2389026-T3 |
| titleOfInvention |
Method for manufacturing a silicon dioxide anti-reflective coating, a resulting product and a photovoltaic device comprising the same |
| abstract |
A process for manufacturing a low index coating based on silicon dioxide, the process comprising: forming a silicon dioxide precursor comprising a silicon dioxide sol comprising a silane and / or a colloidal silicon dioxide; depositing the dioxide precursor of silicon on a glass substrate to form a coating layer; cure and / or bake the coating layer in an oven at a temperature of about 550 to 700 ° C for about 1 to 10 minutes; form a surface treatment composition comprising octadecyl phosphonic acid; depositing the surface treatment composition on the coating layer, and curing and / or baking the surface treatment composition to form a coating layer. |
| priorityDate |
2007-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |