http://rdf.ncbi.nlm.nih.gov/pubchem/patent/ES-2359846-T3

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_adb0e564374fedf34b36103d36e6455a
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-17
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-01
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-04
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-21
filingDate 2007-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2011-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a936c9d781f644c5619902d8480dc38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43fd9a1e086d746e82d72f3f22f5ce25
publicationDate 2011-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber ES-2359846-T3
titleOfInvention COMPOSITIONS OF INSURED POLYESTER RESIN.
abstract A two component composition comprising a first component and a second component, wherein the first component is a resin composition comprising an unsaturated polyester resin or a vinyl ester resin, a 2+ copper compound, at least one organic base that It contains N and is selected from an amine compound and / or an ammonium salt; where the amine compound has the following formula: and the ammonium salt has the following formula R 1 R 2 R 3 N + H where R 1, R 2 and R 3 can each individually represent hydrogen (H), C1-C20 alkyl , C5-C20 cycloalkyl or C7-C20 alkylaryl, where each optionally may contain one or more heteroatoms (eg, oxygen, phosphorus or sulfur atoms) and / or substituents and there may be a ring between R1 and R2, R2 and R3 and / or R1 and R3, which may contain heteroatoms and where copper is present in an amount of at least 50 ppm (relative to the primary resin system), where the resin composition contains less than 0.01 mmol of cobalt per kg of primary resin system, the resin composition has an acid number that is in the range of 0.001-300 mg of KOH / g of resin composition, the molecular weight of the resin containing reactive unsaturations is found in the range of 500 to 200,000 g / mol; and where the second component comprises a peroxide compound.
priorityDate 2006-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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