| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b2bed4b4d247d7fe14cfd9610d22c463 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T50-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2982 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3429
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3491
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2006-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d50a7c3a6a41d3617d67a3f6804440d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ae36cf7c89999518e8724542bcae675 |
| publicationDate |
2011-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
ES-2349426-T3 |
| titleOfInvention |
PROCESSING DEVELOPMENT BY THERMAL PROJECTION OF A SILICON AND CIRCONY-BASED DIANA. |
| abstract |
Composition of a compound comprising the components defined below and expressed in percentage by mass, which allows the production of a target by a thermal projection process, especially by plasma, characterized in that it consists essentially of: - Al: 2 to 20% - Yes: 25 to 45% - ZrSi2: 45 to 70% |
| priorityDate |
2005-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |