http://rdf.ncbi.nlm.nih.gov/pubchem/patent/ES-2325221-T3
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D21C9-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D21C9-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D21H25-04 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D21H25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D21C9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D21C9-10 |
filingDate | 2006-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee276b7dd33b8438875acfb10bbac9a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89d53634be6fdb90f69a2d713c86dbfb |
publicationDate | 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | ES-2325221-T3 |
titleOfInvention | METHOD FOR THE TREATMENT OF A PROCESS MATERIAL WITH LARGE SURFACE PLASMA. |
abstract | Method for the treatment of a process material, where - the process material is contacted with a large surface area, preferably non-thermal, preferably at least atmospheric pressure, - the plasma is generated in the immediate vicinity of the material process or a gas discharge is generated, in particular a corona discharge, in the process material or in the immediate surroundings, preferably at at least atmospheric pressure, characterized in that the plasma generation or gas discharge is caused between the high voltage pulse electrodes (43, 44) (66, 67) with a duration (62) of at least 10 µs. |
priorityDate | 2005-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.