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filingDate 2006-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee276b7dd33b8438875acfb10bbac9a5
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publicationDate 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber ES-2325221-T3
titleOfInvention METHOD FOR THE TREATMENT OF A PROCESS MATERIAL WITH LARGE SURFACE PLASMA.
abstract Method for the treatment of a process material, where - the process material is contacted with a large surface area, preferably non-thermal, preferably at least atmospheric pressure, - the plasma is generated in the immediate vicinity of the material process or a gas discharge is generated, in particular a corona discharge, in the process material or in the immediate surroundings, preferably at at least atmospheric pressure, characterized in that the plasma generation or gas discharge is caused between the high voltage pulse electrodes (43, 44) (66, 67) with a duration (62) of at least 10 µs.
priorityDate 2005-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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