| abstract |
Material with fulerene structure,nManufacturing procedure and its applications.n n n The invention describes a carbon-based material with a fulerene type structure, more specifically consisting of carbon with partially hydrogenated sp2 hybridization. up to an atomic content of 35%, preferably between 5 and 35%. Its manufacturing process is carried out on a substrate at low temperature, between 25 and 300ºC, by means of the technique of chemical deposition in the plasma-assisted vapor phase (PACVD), containing in its bosom highly energetic ions, being able to be applied to non-heat resistant materials expanding the range of applications. These materials are useful for the manufacture of, for example, mechanical, optical devices, magnetic media, aircraft wings, glasses and plastics or photodetectors. |