| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d4ada69388e0a1b68daaf536597c732 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1279
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-5035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02 |
| filingDate |
1992-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e09aeb8b94a697e9490bfa86b00a6e9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fca9225e5694b87a17e64a3b1c01ed1f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a130f4bd1213a918abdfd72d861475ab |
| publicationDate |
2002-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
ES-2176184-T3 |
| titleOfInvention |
PROCEDURE FOR SILVER SUBSTRATE COATING. |
| abstract |
THE PRESENT INVENTION REFERS TO A METHOD FOR THE FORMATION OF A SILICON COATING IN A SUBSTRATE. THE METHOD IS TO COVER A SUBSTRATE WITH A SILICON PRECURSOR THAT HAS A FUSION POINT BETWEEN 50 AND 450 (GRADES) C APPROXIMATELY. THE COATING IS WARMED AT A TEMPERATURE HIGHER THAN YOUR FUSION POINT IN AN INERT ENVIRONMENT TO ALLOW THE COATING TO BE CASED AND FLOWS. THE FOUNDED COATING IS WARMED THEN IN AN ENVIRONMENT THAT FACILITATES THE SILVIC CONVERSION DURING A SUFFICIENT TIME TO BECOME SILICE. |
| priorityDate |
1991-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |