| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c85d78c6a4459b5dbbc49c82a4c5c107 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6836
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2019-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0838eac604d324e8df41e4ef4f7b3fd5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_411c7bdaf2795a249abd0b4c30e0a313
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3885f12bcd688b9cc29e16abecc37018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_970dd6fa471eb63a909d91073c63aef3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_158c0e5c0d1395cde0038dd484913283 |
| publicationDate |
2022-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-4022021-A1 |
| titleOfInvention |
Photoresist stripping composition |
| abstract |
A photoresist stripping composition comprising an organic amine and a method is provided. The photoresist stripping composition comprising an organic amine having the following formula (1). |
| priorityDate |
2019-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |