| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F26B5-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2020-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6408ce21db197c68e79a8c34bdcf134b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6990198dd6b31314b784d3cde874cbe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a8f8b0bc2364ca6fe941973232b8a30 |
| publicationDate |
2022-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3940749-A1 |
| titleOfInvention |
Composition for drying recessed and projected pattern and method for producing substrate having surface that is provided with recessed and projected pattern |
| abstract |
The composition for drying an uneven pattern of the present invention includes a sublimable substance, and a solvent whose boiling point at 1 atm is lower than a boiling point or a sublimation point of the sublimable substance by 5°C or more and whose boiling point at 1 atm is 75°C or lower. |
| priorityDate |
2019-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |