| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dfcdab27b778da1d6b6420d581d0c2fe |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22 |
| filingDate |
2015-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78f884b60ba1ce2a34ee2fedc957db8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f4784b0ce3e47ec690e4e0c2adad709
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96bb75b1446dc2293d0992883fafb548
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36fb35f39680edbbd46080b76e8326b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dee51d9421ca7bf6bfe5b8ea8fdc02a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e8d682a8b9f843d49dbe4b4a03f2490
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3818eb17f213072f19b65606564b9918
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4a8d6f5da34cfed43f11d7f583c10d2 |
| publicationDate |
2021-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3889159-A2 |
| titleOfInvention |
Organometallic solution based high resolution patterning compositions |
| abstract |
Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination. |
| priorityDate |
2014-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |