http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3875636-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36e3b69407f929ae027729351a31a662 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-026 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D15-00 |
| filingDate | 2020-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c37f7b9e017810d3dc7b5f86210e651c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcffff18e27710f9ff704b9277c89c5b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed37ccf08fab89dee730eb2566a2d5ae |
| publicationDate | 2021-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-3875636-A1 |
| titleOfInvention | Method for the plasma electrolytic oxidation of a metal substrate |
| abstract | A method for producing an oxide layer with non-metallic nanoparticles integrated into the oxide layer on a metal substrate by means of plasma-electrolytic oxidation, comprising the steps of: providing a metal substrate and non-metallic nanoparticles in an electrolyte, and applying a pulsed voltage to the metal substrate, the nanoparticles provided in the electrolyte having a negative zeta potential with respect to the electrolyte, and wherein the pulsed voltage have sequences of plateaus with essentially constant voltage or constant current density, wherein in step A a first plateau with essentially constant positive voltage or constant positive current density is applied, wherein the nanoparticles are applied to the Metal substrate are attracted, with the plasma-electrolytic oxidation of the metal substrate taking place in step B and a second plateau with a substantially constant positive voltage or constant positive voltage r current density is applied, the constant positive voltage or constant positive current density of the second plateau being more positive than that of the first plateau, optionally repeating steps (A) and (B) and wherein in a step C a third plateau with a substantially constant negative voltage or constant negative current density is applied and nanoparticles that are not integrated into the oxide layer are repelled from the metal substrate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115094497-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115094497-A |
| priorityDate | 2020-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.