http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3854492-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
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filingDate 2019-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_683ba76c57c976d47320a16adae97428
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publicationDate 2021-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-3854492-A1
titleOfInvention Apparatus for cleaning component of semiconductor production apparatus, method for cleaning component of semiconductor production apparatus, and system for cleaning component of semiconductor production apparatus
abstract The object of the present invention is to provide a cleaning apparatus for a component of a semiconductor production apparatus, which is capable of preventing the attachment of reaction products into the cleaning processing furnace by a simple structure, the present invention provides a cleaning apparatus (1) for a component of a semiconductor production apparatus including: a cleaning processing furnace (2) which is configured to house the component (10) of a semiconductor production apparatus; a heating device (3); a gas introduction pipe (4); a gas discharge pipe (5); a decompression device (6); a first temperature control device (7); a second temperature control device (8); and a purge gas supply device (9).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022293436-A1
priorityDate 2018-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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