http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3854492-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d610873487d2bc9668c04d7c2ec8e6c |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 |
filingDate | 2019-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_683ba76c57c976d47320a16adae97428 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c409796939e632575d99d566e15184d4 |
publicationDate | 2021-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-3854492-A1 |
titleOfInvention | Apparatus for cleaning component of semiconductor production apparatus, method for cleaning component of semiconductor production apparatus, and system for cleaning component of semiconductor production apparatus |
abstract | The object of the present invention is to provide a cleaning apparatus for a component of a semiconductor production apparatus, which is capable of preventing the attachment of reaction products into the cleaning processing furnace by a simple structure, the present invention provides a cleaning apparatus (1) for a component of a semiconductor production apparatus including: a cleaning processing furnace (2) which is configured to house the component (10) of a semiconductor production apparatus; a heating device (3); a gas introduction pipe (4); a gas discharge pipe (5); a decompression device (6); a first temperature control device (7); a second temperature control device (8); and a purge gas supply device (9). |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022293436-A1 |
priorityDate | 2018-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.