| abstract |
A method and apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The DLI system includes a liquid precursor source vaporization system, which vaporizes liquid stably and efficiently. In one implementation, the DLI system is a closed loop integrated system which combines, an injection valve (IV) along with a Liquid Flow Meter (LFM), an ampoule assembly as a source of pressurized precursor, an inert push gas to pressurize the precursor in the ampoule assembly, a temperature controller to maintain a targeted temperature regime, leak detection and controlled carrier gas flow to gas heater. |