| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3467
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-352
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3485
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3417
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3452 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 |
| filingDate |
2019-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_468109cabd1f7e9b6251ce554cd42e79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_447008b6c9cf1219d32f79e3c6212335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c95f05878cf78300baeaeae45cf362d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea1933c81b35790ded6f7eac4cc484a0 |
| publicationDate |
2021-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3833799-A1 |
| titleOfInvention |
Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate guiding |
| abstract |
The invention relates to a device and a method for producing layers with very good uniformity in coating systems with horizontally rotating substrate guiding. Alternatively, certain layer thickness gradients can be set. The particle loading is also significantly reduced. The service life is much higher compared to other methods. Parasitic coatings are reduced. The coating rate is also increased. |
| priorityDate |
2018-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |