| abstract |
Provided is a chemical-mechanical polishing composition including an abrasive, a basic component, a polyoxyalkylene alkyl ether represented by the formula (i) RO-(AO)<sub>n</sub>-H, wherein R is a linear or branched C<sub>1</sub> to C<sub>15</sub> alkyl group, A is an alkylene group selected from the group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents average addition mol numbers of AO and is 2 to 30, and an aqueous carrier, a rinse composition including the polyoxyalkylene alkyl ether and an aqueous carrier, and a substrate chemical-mechanical polishing method and a rinsing method in which these are used. |