| abstract |
There are provided: a thermosetting coloring composition for a color filter for a solid-state imaging element which is capable of suppressing damage to an organic film layer when releasing a photoresist; and a production method for a color filter using the composition. The above-described object is solved by a coloring composition used for forming a colored pattern of a color filter for a solid-state imaging element, the color composition including: an organic pigment (A); a dispersant (B); an epoxy compound (C); a solvent (D); and a coloring matter derivative (E), in which a content of the organic pigment (A) is at least 50 mass% with respect to a non-volatile content in the coloring composition, the dispersant (B) contains a dispersant (b1) having an acidic functional group and/or a dispersant (b2) having a basic functional group, and the epoxy compound (C) is at least one compound selected from the group consisting of glycerol polyglycidyl ether, bisphenol-type polyglycidyl ether, and hydrogenated bisphenol-type polyglycidyl ether. |