| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0dd3a26be0af8dfeed6ad7050b521cf1 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-652
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-818 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-343 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2018-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5e7bfaafc3ea94dc7a2109a9c53c3a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4996f8d81959a3596fccbd9b0d73259a |
| publicationDate |
2020-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3716317-A1 |
| titleOfInvention |
Gas treatment apparatus |
| abstract |
This invention relates to a gas treating apparatus. More specifically, one embodiment of this invention can provide a gas treating apparatus comprising a duct component formed from a flow channel wherein gas to be treated flows; an interior cover component installed on the outside of the circumferential surface of said duct component; and a solution supply apparatus connected to a vaporisation chamber formed between said duct component and said interior cover component to inject reaction solution into said vaporisation chamber, wherein said duct component is provided so that the heat of said gas to be treated is conveyed to said reaction solution injected into said vaporisation chamber. |
| priorityDate |
2017-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |