http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3674365-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb4ee28d43b5e8d4a3c5141fa9bcfeb0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2201-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2201-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2003-3009 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L27-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L27-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-12 |
| filingDate | 2018-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a33a76e9a05a7a3c0063a06e2afe4f58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bb7f9d38e8dd1e37eabeb2800215fd8 |
| publicationDate | 2020-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-3674365-A1 |
| titleOfInvention | Crosslinkable elastomer composition and fluororubber molded article |
| abstract | The invention aims to provide a crosslinkable elastomer composition having a small weight reduction percentage and amount of particles generated after plasma irradiation under specific conditions and a small compression set at high temperature. The invention relates to a crosslinkable elastomer composition including a crosslinkable elastomer and a surface-oxidized non-oxide ceramic. The invention also relates to a fluoroelastomer molded article having a weight reduction percentage of 2.5% by mass or less and an amount of particles generated of 0.05% by mass or less after O 2 plasma irradiation under the following conditions, a weight reduction percentage of 1.8% by mass or less and an amount of particles generated of 0.05% by mass or less after NF 3 plasma irradiation under the following conditions, and a compression set of 50% or less after aging at 300°C for 70 hours. The conditions are as follows. Sample: O-ring (AS-568A-214), Measurement details: (1) O 2 plasma Plasma irradiation device: ICP high-density plasma device (MODEL RIE-101iPH available from Samco Inc.) Irradiation conditions Gas flow rate: 16 SCCM, RF output: 400 Wh, Pressure: 2.66 Pa, Etching time: 30 minutes, Temperature: 100°C . These conditions allow a perfluoroelastomer (non-filler) to be etched at a rate of 12000 A/min. (2) NF 3 plasma Plasma irradiation device: ICP high-density plasma device (MODEL RIE-101iPH available from Samco Inc.) Irradiation conditions Gas flow rate: 16 SCCM, RF output: 400 Wh, Pressure: 10 Pa, Etching time: 4 hours, Temperature: 200°C. These conditions allow a thermally oxidized silicon (SiO 2 ) wafer film to be etched at a rate of 90 A/min. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021038424-A1 |
| priorityDate | 2017-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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