| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_527d41cad118be2c39e19a33eab54468 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08B37-0012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F299-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L5-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2017-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2f0cd4af41b5028c33af2a4d42079c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3963badabbaf9ee529bbd7354ad27d |
| publicationDate |
2020-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3654102-A1 |
| titleOfInvention |
Underlayer film-forming composition, pattern-forming method, and copolymer for forming underlayer film used for pattern formation |
| abstract |
The present invention provides an underlayer film-forming composition in which the material used is dissolved in an organic solvent, and which is capable of forming an underlayer film that is not prone to cracking under the atmosphere and by heat treatment at a relatively low temperature and which is increasing the coated film residual rate upon forming the underlayer film.An underlayer film-forming composition for forming an underlayer film used for pattern formation, which comprises a copolymer and an organic solvent;the copolymer comprises a polymer moiety (a) and a polymer moiety (b);the polymer moiety (a) comprises a saccharide derivative moiety;the saccharide derivative moiety is at least one of a pentose derivative moiety or a hexose derivative moiety; andthe polymer moiety (b) comprises no saccharide derivative moiety. |
| priorityDate |
2017-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |