Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_98a75c9fff239084cf3c988c59841957 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76224 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-00 |
filingDate |
2019-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2022-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5355b61940d8d3d8c1adf36b1bb7af62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbc4e85e963216bd77e51338e2842080 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6d53f6a0cae9f6c4043bf21817ae8b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a15575a891911fd190c804d027c305cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64088cc30f69dd9a1036a9b9a31ee853 |
publicationDate |
2022-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-3628713-B1 |
titleOfInvention |
High oxide vs nitride selectivity, low and uniform oxide trench dishing in shallow trench isolation (sti) chemical mechanical planarization polishing (cmp) |
priorityDate |
2018-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |