| abstract |
Composition for nail makeup product comprising at least one cosmetically acceptable organic solvent, at least one film-forming agent and a photocrosslinking system comprising at least one (meth) acrylic monomer and / or oligomer and at least one photoinitiator; the composition further comprising at least one constituent chosen from hydrophilic fumed silica, hydrophobic fumed silica, modified clays and their mixtures; to improve the gloss and the hold of said composition. |