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filingDate 2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88e2604c5d0e0be191f5c83af5295451
publicationDate 2019-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-3559302-A1
titleOfInvention Linear source for vapor deposition with heat shields
abstract A long high-temperature high-output linear evaporation source apparatus (200) for atomic vapor deposition of metal atoms suited for the production of CIGS thin films, comprising at least one elongated horizontal crucible (50) for containing, up to a given level in the crucible (50), material (55) to be melted and evaporated, comprising a heater assembly (100) and at least a nozzle (65), comprising at least one heat shield assembly (80, 90) that at least partially surrounds the crucible (50) and comprises at least one shielding layer (83, 93) made of graphite or carbon foam or felt, so as to reduce radiation of heat away from the linear evaporation source (200). This enables to achieve a more even spatial distribution of the deposited material with less energy expense and the possibility to regulate an evaporation profile.
priorityDate 2016-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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