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filingDate 2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8231526289bc9794052cd8ffeeb550ff
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publicationDate 2019-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-3552049-A1
titleOfInvention Anti-reflective surface structures formed using three-dimensional etch mask
abstract The invention relates to methods for fabricating antireflective surface structures (ARSS) on an optical element using a three-dimensional film layer applied to the surface of the optical element. The methods beneficially permit materials that do not exhibit local variation in physical and chemical properties to be provided with ARSS. Optical elements having ARSS on at least one surface are also provided.
priorityDate 2016-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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