| abstract |
The invention relates to a continuous separation installation (10; 20; 30; 50) for the galvanic deposition of a substance on objects (1), wherein said continuous separation installation (10; 20; 30; 50) comprises contacting devices (12; 22a, 22b; 32a, 32b; 52) having at least one electrically conductive contact arm (13; 33a, 33b, 33c, 33d, 53a, 53b, 53c), and wherein the contacting devices (12; 22a, 22b; 32a, 32b; 52) are arranged in areas of the continuous separation installation, which are free from an electrolyte (7) used for the galvanic deposition of the substance. The invention also relates to an assembly (60) for a continuous separation installation (50). |