| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de498babb0c04a00ceb653738877b147 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76841
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C251-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C251-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate |
2017-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0701845e5186301c029508797bd4590
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10359a6075ec23e1fdf4e73a80295781
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14f87cd55c3b72d5ceb3f3a479800cea |
| publicationDate |
2019-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3476827-A1 |
| titleOfInvention |
Vanadium compound, starting material for thin film formation, and method for producing thin film |
| abstract |
A vanadium compound represented by following General Formula (1).n n In General Formula (1), R 1 represents a linear or branched alkyl group having 1 to 7 carbon atoms and n represents a number from 2 to 4. R 1 preferably represents a secondary alkyl or a tertiary alkyl. It is preferred that in General Formula (1), n is 2 and R 1 is tert-butyl group or tert-pentyl group, since the compound has a broad ALD window and high thermal decomposition temperature to be able to form a good quality vanadium-containing thin film that has a small carbon residue when used as an ALD material. |
| priorityDate |
2016-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |