http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3443816-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9db1e34dedf96e41e18056bcabe7ab36 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-12 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3255 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32348 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32825 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate | 2016-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a94f4972b501ea5ba74b4601c8193a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6b11c68bade52aa43fa7d144ae14bf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_936f314df5fa5c6bb5fe5a31795ea758 |
| publicationDate | 2019-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-3443816-A1 |
| titleOfInvention | A machine and a process for the atmospheric plasma treatment of different materials using gaseous mixtures comprising chemicals and/or monomers |
| abstract | The invention relates to a machine for the plasma treatment of various materials comprising a first cathode (1) and a second cathode (2) positioned opposite one to the other, each cathode comprising a plurality of first (3) and second (5) conductor electrodes embedded in portions of dielectrically insulating material (9) and a plurality of channels (7) placed between two adjacent portions of dielectrically insulating material (9) and passing through the second conductor electrodes (5); electrical means apt to generate a first transverse electric field (T) and a second longitudinal electric field (L) between the first cathode (1) and the second cathode (2); supply means (6) apt to supply a gaseous mixture (4) in a region of space traversed by the lines of force of the transverse (T) and longitudinal (L) electric fields, the gaseous mixture (4) being supplied in a uniform manner in said region and the electric fields being such as to trigger the breakdown of the gaseous mixture (4) and generate in this way a plasma in said region. The invention also relates to the relative processes for the plasma treatment of various materials and a gaseous mixture (4) which can be used for the plasma treatment of various materials comprising chemicals and/ or monomers. |
| priorityDate | 2016-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.