Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2016-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a61e53769f8d13ed96746431120e6547 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c234bce709d47dd2fc598088cea5da49 |
publicationDate |
2018-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-3347769-A1 |
titleOfInvention |
Method for selective etching of a block copolymer |
abstract |
The invention relates to a method for etching an assembled block copolymer layer comprising first and second polymer phases, in which the etching method includes exposing the assembled block copolymer layer to a plasma so as to etch the first polymer phase and simultaneously to deposit a carbon layer on the second polymer phase, the etching method being characterised in that the plasma is formed from a gas mixture comprising a depolymerising gas (Z) and an etching gas selected among the hydrocarbons (CxHy). |
priorityDate |
2015-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |