| abstract |
There is provided a radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition comprising as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1) n n R 1 a R 2 b Si(R 3 ) 4-(a+b) Formula (1) n nwherein R 1 is an organic group of Formula (1-2)n nand is bonded to a silicon atom through a Si-C bond or a Si-O bond, and R 3 is a hydrolyzable group; and Formula (2) n n R 7 c R 8 d Si(R 9 ) 4-(c+d) Formula (2) n nwherein R 7 is an organic group of Formula (2-1)n n, and is bonded to a silicon atom through a Si-C bond or a Si-O bond, and R 9 is a hydrolyzable group. |