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filingDate 2016-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09aa2a5254caf70e5fb6a37d221b5218
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publicationDate 2018-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-3296424-A1
titleOfInvention Chemical vapor deposition starting material comprising heterogeneous polynuclear complex, and chemical vapor deposition method using said chemical vapor deposition starting material
abstract The present invention relates to a chemical deposition raw material including a heterogeneous polynuclear complex in which a cyclopentadienyl and a carbonyl are coordinated to a first transition metal and a second transition metal as central metals, the chemical deposition raw material being represented by the following formula. In the following formula, the first transition metal (M 1 ) and the second transition metal (M 2 ) are mutually different. The number of cyclopentadienyls (L) is 1 or more and 2 or less, and to the cyclopentadienyl is coordinated one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less as each of substituents R 1 to R 5 . With the chemical deposition raw material of the present invention, a composite metal thin film or a composite metal compound thin film containing plural metals can be formed from a single raw material.
priorityDate 2015-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 53.